About the role
AI summarisedJoin an inclusive team at Micron Technology, a leader in memory and storage solutions, to drive relentless innovation through the R&D, operation, and sustainment of advanced CDSEM metrology techniques. This role involves developing best-in-class metrology methods to support advanced semiconductor nodes and scaling strategies.
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Key Responsibilities
- Lead R&D, operation, and sustainment of advanced CDSEM metrology, including AFM, overlay/registration, X‑ray metrology, and optical techniques.
- Develop, qualify, and standardize CD metrology methods to achieve best‑in‑class accuracy, precision, and repeatability for advanced nodes.
- Drive inline detection strategies in close collaboration with process and integration teams to enable rapid learning cycles.
- Perform detailed CD, profile, and roughness analysis to diagnose process issues and ensure robust pattern fidelity.
- Partner with design, process, and integration teams to define metrology requirements and monitoring schemes for advanced patterning.
- Generate high‑impact metrology reports with clear data interpretation, root‑cause analysis, and actionable recommendations.
- Establish and advance state‑of‑the‑art CD metrology capabilities, including tool benchmarking and workflow optimization.
- Mentor and coach engineers, building deep technical capability and a culture of metrology excellence.
Requirements
- 2 years in industry metrology experience working with CDSEM (preferred)
- Experience with optical thin Films, overlay/registration, X-Ray, or AFM/wafer shape is required.
- Process and equipment-related experience in instrumentation and calibration procedures.
- Strong understanding of semiconductor manufacturing processes (diffusion, CVD, Etch, Lithography) and device process flows.
- Excellent digital literacy including data science, AI, and JMP.
- MS/Ph.D. in Engineering, Physics, Material Science or related field plus 2+ years of industry experience (preferred), OR BS + 5 years of proven ability in the semiconductor field.
