Micron Technology

PRINCIPAL ENGINEER - CMP PROCESS DEV

Micron Technology
Integrated Device ManufacturingSingapore, SingaporeOnsitePosted 3 weeks ago

About the role

AI summarised

Micron’s NAND Process Development team in Singapore is seeking an experienced Principal Engineer to join the Advanced Node Technology Development organization. This role drives next-generation NAND technology deployment through process innovation, margin improvement, and close collaboration with global manufacturing and development groups, focusing on advancing CMP process capability for high-volume production.

IDMOnsiteSTPG

Key Responsibilities

  • Own and lead Chemical Mechanical Planarization (CMP) process characterization and advanced process development for 3D NAND and future technology nodes.
  • Collaborate with global teams (Singapore, US, Taiwan, IDF) and vendors to develop and integrate CMP processes aligned with next-generation NAND technology requirements.
  • Transfer developed CMP processes to high-volume manufacturing (Fab10N) and drive continuous improvements in yield, performance, and manufacturability.
  • Develop strategies to expand process margins through consumables development, equipment evaluation, and testing of novel applications.
  • Design, execute, and analyze experiments to validate process robustness, manufacturability, and technology scaling readiness.
  • Serve as a technical subject-matter expert contributing to critical technology decisions and roadmap direction for advanced NAND nodes.
  • Identify process simplification opportunities to improve cost, productivity, and cycle time.

Requirements

  • PhD with ≥5 years, or Master’s degree with ≥7 years, or Bachelor’s degree with ≥10 years of relevant experience in Electrical Engineering, Materials Science, Chemical Engineering, Physics, or a related field.
  • Demonstrated expertise in leading edge CMP polishing equipment such as EBARA WS or AMAT.
  • Deep technical expertise in CMP Process Development, including mastery of CMP equipment operation, polishing mechanisms (dielectric and metal), slurries, pads, conditioning, and process optimization for advanced nodes.
  • Strong understanding of integration and structural impacts related to film deposition and CMP within NAND/Memory processes.
  • Proven ability to perform root-cause analysis using data analytics tools (e.g., Y3) and interpret complex experimental data.
  • Working knowledge of Design of Experiments (DoE) for systematic process development.
  • Ability to lead and mentor junior CMP engineers, driving technical rigor and standards.