Micron Technology

Principal/Staff Engineer Lead, PD Diffusion/Implant

Micron Technology
Integrated Device ManufacturingSingapore, SingaporeOnsitePosted 1 month ago

About the role

AI summarised

As an Engineering Lead, you will be responsible for leading a team in the startup, development, and optimization of processes to enhance product quality, reliability, cost reduction, and productivity within a high-volume manufacturing environment. This role drives manufacturing performance alignment with Micron's strategic objectives across global sites.

IDMOnsiteSTPG

Key Responsibilities

  • Develop the strategic vision for the team and prioritize resources to achieve targets.
  • Drive fab optimization, maximizing output and yield while reducing operational costs and maintaining high quality standards.
  • Achieve targets related to yield, cell performance, cost, and MOR-POR gaps for the respective node.
  • Lead process development efforts focusing on yield, cell improvement, cost reduction, and productivity enhancement.
  • Support department business processes for new tool installations, modifications, relocations, and removals.
  • Address complex technical topics to large audiences, executives, and technology authorities.

Requirements

  • Bachelor's/Masters in Electrical, Materials Science, Physics, Microelectronics, or Chemical Engineering with 5+ years leading a Process Development team in semiconductor R&D or high-volume manufacturing, OR
  • PhD in relevant field with 3+ years leading a Process Development team in semiconductor R&D or high-volume manufacturing.
  • Comprehensive understanding of films deposition, ion implant, and NAND cell device physics.
  • Knowledge and experience in high aspect ratio deposition and implant process development.
  • Demonstrated structured problem-solving capabilities and collaborative approach to problem-solving.
  • Strong communication, interpersonal, and presentation skills (written and verbal).
  • Experience mentoring and managing the performance of direct reports.