A*STAR

Senior/Lead Research Engineer (APM/Lithography), IME

A*STAR
ResearchSingaporeOnsitePosted 1 week ago

About the role

AI summarised

Senior/Lead Research Engineer leading lithography process development and tool qualification for advanced R&D programs at IME, covering immersion to contact aligner technologies across 6-12 inch substrates including SiC/GaN/Photonics applications.

ResearchOnsiteInstitute of Microelectronics

Key Responsibilities

  • Leading central lithography team under pattern transfer group
  • Actively working with cross functional stake owners to plan and develop new lithography process
  • Validate design, reticle tap out and post tap out verification
  • Assist in internal and external technical discussion to overcome process related challenge and provide relevant solution
  • Perform process characterization, margin study to determine the process capability of new process platform
  • Act as a subject matter expert and resource for researchers and industry partners to enable process and/or product realization
  • Publish process development outcome and breakthrough in research community
  • Engage with relevant equipment makers/vendors and responsible for selecting and procuring research equipment
  • Work with fab team in establishing SPC for newly developed process

Requirements

  • Ph.D/Master/Bachelor Degree in Materials Science, Electrical Engineering, Chemical Engineering, Physics, Chemistry, and Microelectronics, or closely related fields are welcome to apply
  • More than 10 years relevant working experiences in R&D and/or industry environment with broad exposure in handling 6”, 8” and/or 12” substrate covering nano to micron tech nodes, preferably experiences in SiC/GaN/Photonics
  • Proficient in Photolithography tools including Immersion/KrF/I-line Scanner/Stepper/Mask Aligner, knowledge in EBEAM Lithography tool will be added advantage
  • Hands-on experiences in metrology including but not limited to CDSEM, Overlay, OCD, DRSEM, Microscope. Capable to create recipe to support various research requirement
  • Knowledge in design and simulation (Prolith, OPC, etc), reticle layout (oas, gds) review and basic tap out process
  • Relevant hardware and application knowledge in Lithography tools and metrology
  • Possess good interpersonal and oral/written communication skills, with ability to deliver clear and concise messages to both internal and external stakeholders