About the role
AI summarisedThe role leads photolithography pathfinding projects, defines technology roadmaps, and mentors engineers within Micron's Technical Leadership Program.
IDMOnsiteSTPG
Key Responsibilities
- Define and lead pathfinding photolithography projects for future technology nodes and novel memory architectures
- Establish long‑term photolithography technology vision and roadmaps aligned with device scaling, yield, cost, and manufacturability goals
- Drive early development and de‑risking of disruptive lithography solutions, including materials, processes, equipment, and patterning schemes
- Serve as a recognized technical authority influencing technology decisions across R&D, integration, and manufacturing organizations
- Lead cross‑functional and cross‑site initiatives ensuring alignment and execution of high‑impact technology programs
- Partner with suppliers to co‑innovate next‑generation tools, materials, and metrology capabilities
- Oversee advanced process development including imaging, overlay, OPC, process window optimization, and advanced process control
- Generate and steward intellectual property including patents, publications, and internal technical standards
- Mentor and develop engineers as part of Micron’s Technical Leadership Program
Requirements
- Ph.D. (preferred) or M.S. in Electrical Engineering, Materials Science, Physics, Chemical Engineering, or related field with at least 15 years experience in semiconductor photolithography advanced process development
- Recognized expertise in advanced imaging physics including immersion lithography, polarized illumination, low‑k1 imaging, and pattern fidelity challenges
- Proven record of defining and leading high‑impact technology programs from concept through development and transfer
- Strong command of lithography simulation, materials characterization, and statistical analysis
- Demonstrated ability to influence technical direction at the organizational or enterprise level
- Exceptional problem‑solving, communication, and technical leadership skills
- Extensive hands‑on and strategic experience with EUV and advanced DUV lithography (365nm, 248nm, 193nm)
- History of path finding or pre‑development leadership for new technology nodes or of ‑